IC Manufacturing Materials
AEMC provides Positive PR, Polyimide, Electronic grade Developer and BARC which can be applied to IC manufacturing process.
|
PRODUCT |
PRODUCT FEATURES |
SUITABLE PROCESS |
APPLICATIONS |
|
(1) g, i line PR |
Positive Photo-resist |
Spin coating TMAH developing |
IC / MEMS Dry / wet etching |
|
(2) High Rs series |
Positive Photo-resist |
iline Spin coating TMAH developing |
IC High resolution Dry / wet etching Ion implantation |
|
(3) Pl series |
PSPI (Photo sensitive polyimide) |
Spin/Spray coating Broadband/i-line TMAH developing |
Passivation layer |
|
(4) Electronic Developer |
Developer |
Low metal Low particle |
Developing for Special PR |
|
(5) Electronic BARC |
BARC |
High Anti-Dry/Wet etching Low metal Low particle |
BARC Protective layer |
AEMC provides electronic surfactant/developer/solvent which can be applied to advanced IC manufacturing process. We also deliver a broad range of differentiated technology-based products for cleaning chemistries.