This negative type of photo spacer (PS) photo resist can be used as the spacer for Cell Gap in TFT-LCD. The photo resist is created by customer requirement and can be applied to G2 to G8.5 CF substrates with slit/spin, spin or slit coating processes. In addition, the viscosity can be designed.
- Excellent coating and development properties
- High sensitivity
- High resolution
- High mechanical strength
- Good thermal, chemical and light resistance